Plasma-supported deposition of thin insulating layers on substrates - buy vaporising insulating material and ionising in plasma of low energetic arc discharge

摘要

Plasma-supported deposition of thin insulating layers on substrates comprises vaporising an insulating material or a material, which is deposited as insulating material in a reactive atmos., and ionising in a plasma of a low energetic arc discharge. The low energetic arc discharge is produced between a hollow cathode (4) and an anode, in which the anode (5) is heated to a temp. above the melting temp. of the vaporised material or the decompsn. temp. of the reaction prod. of the vaporised material. An appts. for carrying out the process is also claimed. USE/ADVANTAGE - To form optically transparent, mechanically or chemically resistant oxide and nitride layers.