发明名称 |
DEVICE MANUFACTURING INVOLVING STEP-AND-SCAN DELINEATION |
摘要 |
Fabrication of submicron design rule large scale integrated circuits depends upon use of a strut-segmented mask with struts providing mechanical support to permit thinned mask segments consequently yielding improved resolution. "Stitching" - positioning of projected segment images to yield a satisfactory continuous image - is aided by lithographically defined skirts forming a continuous border within strut-supported segments. |
申请公布号 |
CA2083112(A1) |
申请公布日期 |
1993.07.01 |
申请号 |
CA19922083112 |
申请日期 |
1992.11.17 |
申请人 |
AMERICAN TELEPHONE AND TELEGRAPH COMPANY |
发明人 |
BERGER, STEVEN D.;LEVENTHAL, MARVIN;LIDDLE, JAMES A. |
分类号 |
H01J37/305;G03F1/20;G03F7/20;H01L21/027 |
主分类号 |
H01J37/305 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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