IN-SITU PHYSICAL VAPOR DEPOSITION SYSTEM

摘要

PURPOSE: An in-situ physical vapor deposition system is provided to perform an in-situ deposition for both faces of a substrate by using a fixed physical vapor deposition source. CONSTITUTION: An in-situ physical vapor deposition system comprises a physical vapor deposition source(3), a vacuum chamber(1), a vacuum pump(2), and a substrate rotator(4). The substrate rotator comprises a rotating plate(9,10), a rotation gear(11), and a fixed gear(12). The rotating plate comprises two or more than two substrate holders to revolve and rotate the substrate holder. The rotating gear is installed to each rotating plate. The fixed gear is fixed to the vacuum chamber or an arbitrary portion to be connected to the rotation gear.