| 摘要 |
PURPOSE:To provide a floating abrasive grain type polishing device with which a work can be accurately polished without transferring it and crack or cutout of the work can be prevented in the early stage of rotation. CONSTITUTION:This polishing device is provided with upper and lower level blocks 3,5, planet gears 4 having work holding holes 4a, and a sun gear 2b and a ring gear 8b meshing with the planet gears 4. A first tank 10 storing abrasive grains of large grain diameter and a second tank 11 storing abrasive grains of small grain diameter are provided above the polishing device, and the abrasive grains are selectively supplied from either of both tanks to the supply holes 3a, 3b of the upper level block 3 through an abrasive grain receiver 14 and hoses 16. |
