发明名称 Method and apparatus for doping silicon spheres
摘要 A method and apparatus for doping silicon spheres (48) with a solid phosphorous source (41, 42) is disclosed. Two solid sheets (41, 42) of solid phosphorous source are held in a chamber (32) and aligned substantially parallel to one another for holding the plurality of silicon spheres therebetween. The chamber (32) temperature is increased to vaporize the sheets (41 and 42) to evenly diffuse phosphorous vapor into the silicon spheres (48).
申请公布号 US5223452(A) 申请公布日期 1993.06.29
申请号 US19910784614 申请日期 1991.10.29
申请人 KNEPPRATH, VERNON E. 发明人 KNEPPRATH, VERNON E.
分类号 H01L21/00;H01L21/223;H01L31/0352;H01L31/18 主分类号 H01L21/00
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