| 摘要 |
<p>PURPOSE:To obtain a photomask which improves the resolution of transfer patterns and is easily formable in the case of stepping of the photomask having isolated patterns as a part of the patterns. CONSTITUTION:Fine 2nd apertures 4, 5 are formed in the peripheral part of a 1st aperture 3 so that the light transmitted through the 1st aperture 3 and the light transmitted through the 2nd apertures 4, 5 interfere with each other by sharpening the light intensity distribution in the position corresponding to the 1st aperture 3 on an imaging plane.</p> |
