发明名称 GLASS WAVEGUIDE FORMED BY USING SI SUBSTRATE AND PRODUCTION THEREOF
摘要 PURPOSE:To provide a glass waveguide which is free from warpage is large in the difference in refractive index between a core and a clad and is low in loss by forming an Si oxide film by a thermal oxidation treatment on the inside surface of the groove formed on the front surface of a substrate. CONSTITUTION:The glass waveguide has the groove 10 formed on the front surface of the Si substrate 1, the Si oxide film 2 formed by the thermal oxidation treatment on the inside surface of the groove 10, the core 3 consisting of high-refraction glass embedded into the groove 10 and the clad layer 4 provided to cover the core 3. Namely, the waveguide is made of the structure in which the greater part of the surface of the core 3 is enclosed and coated with the Si oxide film 2 having a low refractive index and the remaining front surface is coated with the clad layer 4. Since the Si oxide film 2 is formed by being subjected to the thermal oxidation treatment, the structure consisting of the Si oxide film 2 in the lower part 7 of the core 3 bulging to the inner side of the substrate 1 is obtd. Scattering losses are decreased and the electric field distribution within the core is uniformalized by such waveguide structure. In addition, warpage is substantially eliminated.
申请公布号 JPH05164932(A) 申请公布日期 1993.06.29
申请号 JP19910332215 申请日期 1991.12.16
申请人 HITACHI CABLE LTD 发明人 IMOTO KATSUYUKI
分类号 G02B6/122;G02B6/12;G02B6/13 主分类号 G02B6/122
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