| 摘要 |
PURPOSE:To remove lowering of step covering property of an upper layer wiring due to effect of a lower layer isolation insulating film, etc., and to reduce wiring defect by making the upper layer wiring cross with a lower layer wiring on an isolation region which is not affected by the lower layer isolation insulating film, etc. CONSTITUTION:In a crossing region of an upper layer wiring 3 to a lower layer wiring 4, the upper layer wiring 3 is arranged on at least isolation regions 2a, 2b which cross with the lower layer wiring 4. For example, in a region wherein the upper layer wiring 3 crosses with the lower layer wiring 4, it is arranged on the isolation region 2b which crosses with the lower layer wiring 4 at right angles. That is, the upper layer wiring 3 is made to make a detour not to cross on the isolation insulating film 2 of a part along lower layer wiring 4. The upper layer wiring 3 to a step part of the low wiring 4 formed based on the conditions is reliably formed on a flat part through a field insulating film 7 on a supporter layer 5. Thereby, it is possible to reduce effect of current concentration by lowering of step coating properties in the upper layer wiring 3 and to reduce wiring defect. |
