| 摘要 |
<p>PURPOSE:To improve the yield of production and to provide the higher fineness and higher opening ratio by forming the liquid crystal display device into a multilayered structure in which picture element electrodes, the source lines and gate lines of picture element transistors and the picture element electrodes are divided into three layers by insulating films. CONSTITUTION:Source lines 7 to constitute a 1st wiring layer and metallic wirings 8 connecting the picture element electrodes 10 and drain parts are formed. An etching liquid of indium tin oxide film (ITO) penetrates and corrodes from the spacings between the 2nd interlayer insulating films 9 in some cases at the time of patterning the picture element electrodes 10 if the wirings are formed of Al to be normally used as the metallic wirings of low resistance and, therefore, a metal having acid resistance, for example, chromium, is selected as the metallic wirings 8. The film of an insulator, such as quartz, is formed again as the 2nd interlayer insulating film 9 and is opened with contact holes. A transparent conductive film consisting of the ITO, etc., is formed as the picture element electrodes 10 to obtain the contact of the drain parts and the metallic wirings 8. Finally, the film of the insulator is formed as a moisture resistant protective film 11, by which the substrate is completed.</p> |
