| 摘要 |
PURPOSE:To prevent the contamination of wafers by the splashing back of chemical solution from the inner wall of a cup 3. CONSTITUTION:After a developing solution or a chemical solution, which is a coating liquid, has been dripped on a wafer 1, a flat plate 6 is moved and positioned instead of retreating a nozzle, and the splashing back of the chemical solution from the inner wall of a cup 3 is blocked by the above-mentioned flat plate 6. The drop in pressure between the flat plate 6 and the wafer 1 is prevented by an air hole, and the coating and developing operation of the wafer 1 can smoothly be conduted by stabilizing the air stream. |
