| 摘要 |
PURPOSE:To provide a reticule and its producing method, capable of reducing a deviation in the completed dimension, between the marginal part and central part of a device pattern region, on the reticule used for a reducing projection exposure. CONSTITUTION:This reticule is constituted so as to have dummy pattern regions 5a and 5b having the same pattern density as that of a device pattern region 2, and not transferred at the time of exposing, outside the device pattern region 2 transferred at the time of exposing. In the producing method, a constitution is adopted so that the device pattern region 2 and the dummy pattern regions 5a and 5b, are plotted with each data, and the data for plotting the dummy pattern regions 5a and 5b, is segmented from the data for plotting the device pattern region 2. |
