| 摘要 |
<p>PURPOSE:To enable the transparent part of a substrate to be effectively cleaned by a method wherein the surface of the substrate is dipped into solution, and the substrate is irradiated with pulse light from its rear side. CONSTITUTION:The surface of a glass substrate 1 is dipped into Freon 9. By this setup, Freon is made to penetrate into a gap between a foreign object and the glass substrate 1. Furthermore, the glass substrate 1 is irradiated with excimer laser rays 11 from its rear side. Laser rays 11 are absorbed by Freon 9, and thus Freon heats and vaporize to separate the foreign object from the glass substrate 1. That is, light passing through the transparent part of a photomask is absorbed by Freon and converted into thermal energy, which heats and vaporizes Freon. Therefore, foreign objects are separated off from a substrate by Freon gas bubbles.</p> |
