| 摘要 |
The cell gap layer (1) of a liquid crystal display (LCD) device is formed by (a) depositing a silicon oxide (SiO2) thin film of 1-2 μm thickness on the upper and lower glass substrate (2)(3) by the sputtering method, (b) covering a photoresist on the thin film, and drying it, (c) bonding a + type pattern-formed photomask onto the photoresist, and light-exposing it, and (d) etching it with a corrosive. The pattern has at least 10 μm line width.
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