发明名称 POLYMERIC MINUS FILTER
摘要 <p>A polymeric minus filter for an incident electromagnetic spectral band comprises at least one polymeric interference stack tuned to a predetermined design wavelength centered around g<4>, wherein g<4> is in the range of 300 nm to 2000 nm, said filter comprises an optically transparent substrate and having deposited thereon at ambient temperatures (20 to 23 DEG C) a multiplicity of pairs of polymeric thin interference layers plus one final polymeric layer having index of refraction n<6>, each pair of interference layers having a total optical thickness equal to 1/2 wavelength of g<4>, the members of each pair having refractive indices n<5> and n<6>, respectively, wherein the layer having refractive index n<6> is directly superimposed upon said substrate having refractive index ns and wherein ns is approximately equal to n<5>, and wherein n<6> < n<5>.</p>
申请公布号 EP0540215(A3) 申请公布日期 1993.06.23
申请号 EP19920309434 申请日期 1992.10.15
申请人 MINNESOTA MINING AND MANUFACTURING COMPANY 发明人 MILLER, ROBERT H.
分类号 G02B5/28;G02C7/10;(IPC1-7):G02B5/28 主分类号 G02B5/28
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