发明名称 Plasmaless dry contact cleaning method using interhalogen compounds
摘要 A method of removing an oxide layer from an article. The article may be located in a reaction chamber into which an interhalogen compound reactive with the oxide layer is introduced. A temperature of the reaction chamber may be modified so as to remove the oxide layer. The interhalogen compound may form volatile by-product gases upon reaction with the oxide layer. Unreacted interhalogen compound and volatile by-product gases may then be removed from the reaction chamber.
申请公布号 US7033946(B2) 申请公布日期 2006.04.25
申请号 US20020309467 申请日期 2002.12.04
申请人 MICRON TECHNOLOGY, INC. 发明人 SANDHU GURTEJ S.;WESTMORELAND DONALD L.
分类号 H01L21/302;H01L21/285;H01L21/311 主分类号 H01L21/302
代理机构 代理人
主权项
地址