发明名称 |
Plasmaless dry contact cleaning method using interhalogen compounds |
摘要 |
A method of removing an oxide layer from an article. The article may be located in a reaction chamber into which an interhalogen compound reactive with the oxide layer is introduced. A temperature of the reaction chamber may be modified so as to remove the oxide layer. The interhalogen compound may form volatile by-product gases upon reaction with the oxide layer. Unreacted interhalogen compound and volatile by-product gases may then be removed from the reaction chamber.
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申请公布号 |
US7033946(B2) |
申请公布日期 |
2006.04.25 |
申请号 |
US20020309467 |
申请日期 |
2002.12.04 |
申请人 |
MICRON TECHNOLOGY, INC. |
发明人 |
SANDHU GURTEJ S.;WESTMORELAND DONALD L. |
分类号 |
H01L21/302;H01L21/285;H01L21/311 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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