| 摘要 |
Disclosed herein is a photoacid generating polymer represented by Formula 1 below: wherein R<SUB>1 </SUB>is a C<SUB>1-10 </SUB>hydrocarbon or a C<SUB>1-10 </SUB>hydrocarbon in which the hydrogen atoms are wholly or partly replaced by fluorine atoms; R<SUB>2 </SUB>is hydrogen or a methyl group; and a, b, c and d represent the mole fraction of each monomer and are in the range between about 0.05 and about 0.9, such that the sum of a, b, c, and d equals one. Since the photoacid generating polymer of Formula 1 is not water-soluble and acts as a photoacid generator, it can be used to prepare a top anti-reflective coating composition for immersion lithography.
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