发明名称 Method and apparatus for EUV plasma source target delivery target material handling
摘要 An EUV target delivery system and method are disclosed which may comprise: a target material purification system connected to deliver liquid target material comprising: a first container and a second container in fluid contact with the target material reservoir; a filter intermediate the first chamber and the second chamber; a liquid target material agitation mechanism, or at least one purification chamber containing the target material in a form reactive with impurities contained in the inert gas reacting with such impurities and removing from the inert gas the impurities, or providing an evaporation chamber in fluid communication with an impurity chamber and with a target droplet mechanism liquid target material reservoir and containing liquid source material; heating the liquid source material to a first temperature sufficient to evaporate a first set of contaminants; heating the liquid source material to a second temperature sufficient to evaporate lithium.
申请公布号 US2006193997(A1) 申请公布日期 2006.08.31
申请号 US20050067073 申请日期 2005.02.25
申请人 CYMER, INC. 发明人 BYKANOV ALEXANDER N.
分类号 C23C8/00 主分类号 C23C8/00
代理机构 代理人
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