| 摘要 |
PURPOSE:To provide a structure for an X-ray mask with good characteristics, by controlling the line width both in a resist pattern and a plating pattern accurately. CONSTITUTION:An X-ray mask structure containing an X-ray absorbent with a given pattern is formed on an X-ray transmitting film. A plated stencil is used to form the X-ray absorbent pattern. The plated stencil made of an organic resist is located vertically or at a reverse tapered angle to a substrate. The organic resist pattern is treated in both a plating step and a graft polymer step repeatedly to form an X-ray absorbent pattern with a forward tapered angle. |
