Photo-mask used in exposure apparatus, has lattice patterns including series of stripes opaque to light and extending perpendicular to lines of polarization pattern, and stripes have pitch smaller than wavelength of light

摘要

The mask has polarization patterns (210) arranged on a transparent substrate (200), which includes lines extending parallel to each other and the lines are opaque to light. The lattice patterns occupying spaces between the lines, have a series of stripes opaque to light and extending perpendicular to the lines of line/space pattern. The stripes have a pitch smaller than wavelength of light. Independent claims are also included for the following: (1) composite polarization modified illuminating system; (2) exposure apparatus; and (3) method of forming line/space circuit pattern.