Mirror for reflecting in intensive IR radiation esp. laser - is produced by epitaxially depositing on oriented silicon@ substrate
摘要
Mirror for intensive infrared radiation is mfd. by coating a Si substrate with a highly reflective layer of Au, Ag, or Al. The coating is applied epitaxially by vapour deposition at a rate of 0.1-10 nm/min. on the substrate, which has a (111) orientation. A Ca fluoride coating is deposited epitaxially over the metal. ADVANTAGE - Has good reflectivity, wear resistance
申请公布号
DE4141391(A1)
申请公布日期
1993.06.17
申请号
DE19914141391
申请日期
1991.12.16
申请人
TECHNISCHE UNIVERSITAET DRESDEN, O-8027 DRESDEN, DE
