| 发明名称 |
Lithographic material and processes involved in their use. |
| 摘要 |
<p>The use of a terpolymer significantly enhances the properties of resists suitable for deep UV lithography in the manufacture of semiconductor devices. This terpolymer is one represented by the polymer formed from sulfur dioxide, an acid-sensitive monomer moiety and a monomer that imparts polarity to the final terpolymer.</p> |
| 申请公布号 |
EP0546703(A1) |
申请公布日期 |
1993.06.16 |
| 申请号 |
EP19920310594 |
申请日期 |
1992.11.20 |
| 申请人 |
AMERICAN TELEPHONE AND TELEGRAPH COMPANY |
发明人 |
KOMETANI, JANET MIHOKO |
| 分类号 |
C08G75/22;G03F7/004;G03F7/038;G03F7/039;H01L21/027;H01L21/30;H05K3/00 |
主分类号 |
C08G75/22 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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