发明名称 APPARATUS FOR PRODUCING OXIDE GLASS THIN FILM
摘要 PURPOSE:To decrease the heterogeneity generated in the film thickness of porous glass bodies. CONSTITUTION:Fuel and gaseous raw materials are supplied to a torch 13 and glass particulates are deposited on substrates 4. A turn table 16 is rotated simultaneously therewith and a torch 13 is moved back and forth and, therefore, the glass particulates from the torch 13 are uniformly supplied onto the respective substrates 4. Further, a lower heater 20 rotates relatively with the turn-table 16 and since the turn-table 16 and the respective substrates 4 are uniformly heated, the temperature of respective substrate 4 can be kept constant and the glass particulate layers deposited on the substrates 4 are formed homogeneously to a uniform thickness. The substrates 4 are thereafter heated to a high temp. within another furnace, by which the deposited glass particulate layers are made transparent and the oxide glass thin films are obtd.
申请公布号 JPH05147956(A) 申请公布日期 1993.06.15
申请号 JP19910318039 申请日期 1991.12.02
申请人 SUMITOMO ELECTRIC IND LTD 发明人 SAITO MASAHIDE;AIKAWA HARUHIKO;KANAMORI HIROO;URANO AKIRA;HIROSE CHIZAI;ISHIKAWA SHINJI
分类号 C03B19/14;G02B6/13 主分类号 C03B19/14
代理机构 代理人
主权项
地址