| 摘要 |
Cleanup equipment and a cleaning method of a semiconductor substrate are provided to filter efficiently carrier gas by forming a rotatory current generation unit for generating rotatory current. A sealed case(120) includes an inlet(121) for receiving carrier gas generated from a process chamber and an outlet(122) for discharging the carrier gas. A trap plate(140) is installed in the case. A transferring path of the carrier gas is formed with a zigzag structure. A rotatory current generation unit(150) is coupled with a sidewall of the case, and includes a plurality of cylindrical bodies(151) of different sizes. The central cylindrical body of the cylindrical bodies includes a plurality of inflow parts for receiving the carrier gas and a plurality of outflow parts(153). An absorption lamp(160) is connected to the outlet of the sealed case in order to receive the carrier gas from the outlet.
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