| 发明名称 |
Ligand stabilized +1 metal beta-diketonate coordination complexes and their use in chemical vapor deposition of metal thin films |
| 摘要 |
Chemical vapor deposition precursors for depositing copper, silver, rhodium and iridium metals on substrates comprise ligand stabilized +1 metal beta-diketonate coordination complexes of said metals. Uses of such precursors in CVD processes are also provided.
|
| 申请公布号 |
US5220044(A) |
申请公布日期 |
1993.06.15 |
| 申请号 |
US19920852285 |
申请日期 |
1992.03.16 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BAUM, THOMAS H.;LARSON, CARL E.;REYNOLDS, SCOTT K. |
| 分类号 |
C23C16/18;H05K3/40 |
主分类号 |
C23C16/18 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
