发明名称 Semiconductor memory element and method of fabricating the same
摘要 In a gain-cell type semiconductor memory element having a first MOSFET and a second MOSFET, the sources of the first and second MOSFETs are connected to a bit line, the drain of the first MOSFET and the gate of the second MOSFET are connected to each other to serve as a charge storage region, the gate of the first MOSFET is connected to a write word line, the drain of the second MOSFET is connected to a power supply line, and the channel region of the second MOSFET is capacitively coupled via an insulating layer with a read word line thereby to receive substrate biasing by capacitive coupling from the read word line.
申请公布号 US5220530(A) 申请公布日期 1993.06.15
申请号 US19910738543 申请日期 1991.07.31
申请人 OKI ELECTRIC INDUSTRY CO., LTD. 发明人 ITOH, MASAHIRO
分类号 G11C11/403;G11C11/405;H01L21/8242;H01L27/108 主分类号 G11C11/403
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