| 摘要 |
<p>PURPOSE:To make it possible to monitor the spectral intensity of exposing X-ray which faithfully reflects the wavelength characteristics of exposing X-ray by forming transmissive diffraction grids of X-ray absorbing material on the light path of exposing X-ray incident on the outside of pattern region and then measuring the intensity of the exposing X-ray transmitted, while being diffracted, through the transmissive diffraction grids. CONSTITUTION:Transmissive diffraction grids 3 are formed of an X-ray absorbing material in a region, other than a pattern region 7, at a part of an X-ray mask 2. Consequently, a transmitted diffraction light having substantially same wavelength spectrum as an exposing X-ray and attenuated by a factor of 10 can be obtained. Furthermore, only a transmitted diffraction light of specific diffraction order having wavelength within an appropriate range is selected through a slit 9 and them measured through a proportional counter 6. According to the constitution, spectral intensity of exposing X-ray can be monitored by measuring the intensity of transmitted diffraction light without varying the wavelength spectrum of exposing X-ray remarkably.</p> |
