发明名称 |
DEVICE MANUFACTURING METHOD AND LITHOGRAPHIC APPARATUS |
摘要 |
A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber; decreasing the pressure within the vacuum chamber to a production pressure range; generating a beam of radiation with a radiation system; patterning the beam of radiation; and projecting the patterned beam of radiation through the vacuum chamber onto a target portion of a layer of radiation-sensitive material on a substrate.
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申请公布号 |
US2008170210(A1) |
申请公布日期 |
2008.07.17 |
申请号 |
US20070654037 |
申请日期 |
2007.01.17 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MEIJER HENDRICUS JOHANNES MARIA;RENKENS MICHAEL JOZEF MATHIJS |
分类号 |
G03B27/52 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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