POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PURPOSE:To provide the positive type photoresist compsn. having excellent resolution, dry etching resistance and heat resistance. CONSTITUTION:The alkaline soluble novolak resin of the positive type photoresist compsn. contg. the alkaline soluble novolak resin and 1,2- naphthoquione diazide compd. consists of a novolak resin I obtd. by bringing phenols and formaldehyde into addition condensation reaction and a low-polymer compd. II contg. >=50wt.% compd. of 2 to 4 nuclides obtd. by bringing the phenols exclusive of the phenols used for obtaining the novolak resin I and the formaldehyde into addition condensation reaction. This alkaline soluble novolak resin contains two nuclides of a range from 10wt.% to 50wt.%.