| 摘要 |
PURPOSE:To provide the photomask which can be brought into perfectly tight contact with a wafer at all times and, therefore, allows the execution of exposing in an always good state. CONSTITUTION:Grooves 5 extending from the central part of a one surface (mask surface) 1a of a glass plate to the peripheral part P are provided in the form of checker board meshes in the spacings between the patterns 3 of the mask surface 1a of the photomask 1 arrayed with the prescribed patterns 3 on the mask surface 1a. |
