| 摘要 |
PURPOSE:To provide the method for cleaning a substrate to be used for magnetic disks, optical disks, liquid crystal displays, etc. CONSTITUTION:After texture is formed by polishing on the substrate, this substrate is washed with pure water. The substrate 1 is immersed into a water tank 5 contg. an aq. soln. of a surfactant and is subjected in this state to irradiation with ultrasonic waves at a high frequency from 500 to 2000kHz by an ultrasonic vibrator transducer 6 in the bottom of the water tank 5. The agent on the substrate surface is removed by pure water and the substrate is dried by a nitrogen gun, etc. |
