| 发明名称 |
SPUTTERING TARGET MATERIAL |
| 摘要 |
<p>This invention provides sputtering target materials having high reflectance and excellent heat resistance, which are formed of Ag base alloys formed by adding a specific, minor amount of P to Ag and alloying them.</p> |
| 申请公布号 |
EP1690958(A4) |
申请公布日期 |
2008.09.10 |
| 申请号 |
EP20040792511 |
申请日期 |
2004.10.08 |
| 申请人 |
ISHIFUKU METAL INDUSTRY CO., LTD. |
发明人 |
HASEGAWA, KOICHI;ISHII, NOBUO |
| 分类号 |
C22C5/06;C23C14/34;C23C14/20;G11B7/24;G11B7/258;G11B7/26 |
主分类号 |
C22C5/06 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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