| 摘要 |
An exposure apparatus and a method for manufacturing a device are provided to control the exposure and the position determination of a substrate by projecting an original pattern on the substrate using a projection optical system. An original pattern is projected on a substrate using a projection optical system(9). Substrate stages(6a,6b) are comprised in order to maintain substrates(5a,5b). A first detector detects the positions of marks(11a,11b) on the substrate. A controller controls the position determination and the exposure of the substrate. The controller controls the first detector to detect the position while moving the substrate stage. A second detector detects the surface position of the substrate.
|
