发明名称 THIN GAS BARRIER FILMS AND RAPID DEPOSITION METHOD THEREFOR
摘要 <p>Films are coated on substrates, useful for applications such as packaging, having a substantially continuous inorganic matrix in which organosilicon moieties are discontinuously dispersed. The inorganic matrix can be formed by evaporating an inorganic source within an evacuated chamber while at the same time flowing vaporized organosilicon into the chamber adjacent to an electrically isolated substrate. <IMAGE></p>
申请公布号 EP0470777(A3) 申请公布日期 1993.06.02
申请号 EP19910307123 申请日期 1991.08.02
申请人 THE BOC GROUP, INC. 发明人 FELTS, JOHN T.
分类号 B32B9/00;B65D65/42;C08J7/04;C23C14/06;C23C14/10;(IPC1-7):C08J7/06;C23C14/20;B05D7/04 主分类号 B32B9/00
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