Low fabrication cost, high performance, high reliability chip scale package

摘要

The invention provides a new method and chip scale package is provided. The inventions starts with a substrate over which a contact point is provided, the contact point is exposed through an opening created in the layer of passivation and a layer of polymer or elastomer. A barrier/seed layer is deposited, a first photoresist mask is created exposing the barrier/seed layer where this layer overlies the contact pad and, contiguous therewith, over a surface area that is adjacent to the contact pad and emanating in one direction from the contact pad. The exposed surface of the barrier/seed layer is electroplated for the creation of interconnect traces. The first photoresist mask is removed from the surface of the barrier/seed layer. A second photoresist mask, defining the solder bump, is created exposing the surface area of the barrier/seed layer that is adjacent to the contact pad and emanating in one direction from the contact pad. The solder bump is created in accordance with the second photoresist mask, the second photoresist mask is removed from the surface of the barrier/seed layer, exposing the electroplating and the barrier/seed layer with the metal plating overlying the barrier/seed layer. The exposed barrier/seed layer is etched in accordance with the pattern formed by the electroplating, reflow of the solder bump is optionally performed.

主权项

1. A chip package comprising:
a ball grid array (BGA) substrate; a semiconductor device comprising a first substrate having a first surface and a second surface opposite said first surface, a passivation layer on said first surface of said first substrate, a polymer layer on said passivation layer, and a conductive pad having a contact point within a first opening in said passivation layer, wherein a second opening in said polymer layer exposes said contact point; a copper pillar structure having a first surface and a second oxidized surface opposite said first surface, said copper pillar structure having opposing oxidized sidewalls separated by a first width, said first surface of said copper pillar structure being coupled to said contact point through said second opening via a conductive interconnect, said first surface of said copper pillar structure directly on a surface of said conductive interconnect, in which each of said first surface and said second oxidized surface of said copper pillar structure have the same first width; an underbump nickel layer having a second width greater than said first width, a first oxidized surface of said underbump nickel layer directly on said second oxidized surface of said copper pillar structure opposite said first surface of said copper pillar structure; a solder ball directly on a second oxidized surface of said underbump nickel layer opposite said copper pillar structure and said BGA substrate, said second oxidized surface of said underbump nickel layer opposite said first oxidized surface of said underbump nickel layer; an underfill between said semiconductor device and said BGA substrate, wherein said underfill contacts said semiconductor device and at least a portion of said BGA substrate and on said first width of said copper pillar structure and said solder ball; and an encapsulant material on said second surface of said first substrate to encapsulate said semiconductor device, said encapsulant on said opposing oxidized sidewalls of said copper pillar structure.