Patterning in the directed assembly of block copolymers using triblock or multiblock copolymers

摘要

Provided herein are block copolymer thin film structures and methods of fabrication. The methods involve directing the assembly of ABA triblock copolymers such that desired features are formed by domains of the assembled ABA triblock copolymer. In some embodiments, an ABA triblock copolymer is directed to assemble by a chemical pattern. Chemical patterns with periods much different than the natural period of the ABA triblock copolymer may be used to direct assembly of the ABA triblock copolymer.

主权项

1. A structure comprising a thin film overlying a pattern, wherein the thin film comprises microphase-separated domains of an ABA triblock copolymer and wherein the pattern is replicated throughout the thickness of the thin film, wherein the ABA triblock copolymer has a bulk period Lo and the pattern has a period Ls that is greater than or equal to about 1.2 Lo.