| 摘要 |
A plasma treatment apparatus is provided with a vacuum chamber having a rotary plate arranged therein. Within the vacuum chamber, the workpieces are subjected, at a low pressure of an inserted treatment gas, to a glow discharge for surface treatment with high temperatures. The workpieces are transferred through a sluice to the rotary table arranged in the vacuum chamber and are treated at selectable treatment positions. By providing a plurality of rotary tables, the workpieces can be stored in a three-dimensional arrangement. Partition walls are provided for dividing the rotary table into compartments for allowing different types of treatments at different treatment positions. During insertion or removal of workpieces into or from the vacuum chamber, treatment of the other workpieces can be continued. The treatment apparatus is adapted for continuous operation and, additionally, allows different lengths of treatment, temperatures of treatment and plasma activities for the individual workpieces.
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