| 摘要 |
An image development method is disclosed. In the method, a photoresist layer on a metal surface is exposed for development. The developer then used is a solution which will both develop the photoresist image and cause any exposed metal surface to change to a predetermined color. The development process then proceeds until the predetermined color is exposed whereupon the process ceases. The preferred metal is copper and the preferred developer is an aqueous solution of sodium sulphide and ammonium polysulfide.
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