| 摘要 |
<p>PURPOSE:To provide the title alignment method capable of processing wave- forms without making an alignment error when the detected wave-forms are notably different from one another in the X and Y directions during the photosteps in the semiconductor device manufacture. CONSTITUTION:When the detected wave-forms of alignment marks are notably different from one another in the X and Y directions during the various semiconductor manufacturing steps, the wave-form processing steps of the alignment marks in the X and Y directions are respectively and independently set up so that the alignment marks in the X and Y directions may be wave-form processed meeting the optimum requirements. Furthermore, even when the discrepancies between the detected wave-forms in the X and Y directions are not so conspicuous as to make an alignment error, the processing time can be notably cut down while particularly augmenting the alignment precision.</p> |
