发明名称 DEVELOPER FOR PHOTOSENSITIVE ELASTOMER COMPOSITION
摘要 A developer composition for use in developing after imagewise exposure of a photosensitive element member prepared by laminating a support, a layer of a photosensitive elastomer composition containing a diene polymer, and a transparent protective coating layer in order, which composition comprises 60-90 vol.% of at least one hydrocarbon selected from the group consisting of aliphatic and alicyclic hydrocarbons which are substantially free from double bonds, 5-30 vol.% of benzyl alcohol, and 1-10 vol.% of at least one compound selected from the group consisting of specified alcohols and acetates. When this developer is used for producing a photocuring image structure from the photosensitive element member, it is possible in general to remove a transparent protective coating layer comprising polyamide or cellulose completely in a short time together with an uncured part and to produce advantageously an excellent photocuring image structure, in particular a flexographic printing plate, wherein the photocuring image part swells little and is free from defects.
申请公布号 WO9310484(A1) 申请公布日期 1993.05.27
申请号 WO1992JP01493 申请日期 1992.11.16
申请人 ASAHI KASEI KOGYO KABUSHIKI KAISHA 发明人 KOZAKI, SHUJI
分类号 G03F7/00;G03F7/32 主分类号 G03F7/00
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