| 摘要 |
The method comprises the following steps of : providing a reaction chamber (1) comprising a rotatable substrate stage (2), a plurality of nozzles (4-1, 4-2, ..., 4-6) aligned in a line, the nozzle being arranged vertical to a substrate surface, and a mechanism (14, 15) for moving the substrate stage at least in the nozzle alignment direction (Y) and parallel to the substrate surface; disposing the substrate on the substrate stage which is rotated around its axis; flowing a mixed source gas into the reaction chamber through the nozzles, thereby a flow rate of the most reactive gas in the mixed source gas flowing through each nozzle being controlled to increase depending on a distance (D) between the center axis of the substrate rotation and the nozzle; and heating the substrate. An apparatus for applying the above method comprises a particular feature for moving the substrate stage. <IMAGE> |
