| 摘要 |
Disclosed is a baffle apparatus for insertion into a semiconductor wafer processing furnace to diffuse processing gases that are injected into the furnace by an injector nozzle. The baffle apparatus comprises: a diffuser plate assembly having an upper end and a lower end, the diffuser plate assembly having at least one diffuser plate against which injected gases are to be forced; and the lower end of the diffuser plate assembly being sized and shaped to engage with and be supported by an elongated wafer paddle.
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