| 摘要 |
PURPOSE:To easily constitute a potential adjustment exposure means and to facilitate the limitation of an exposure range by allowing the potential adjustment exposure means to use an image exposure device and a scanning optical system in common. CONSTITUTION:A potential adjusting/irradiating means is composed of the potential adjustment beam projecting means 4 and the scanning optical system 5 used for the image exposure device. The potential adjustment beam projecting means 4 is composed of a semiconductive laser 41 and a beam diameter adjusting means 42. As the semiconductive laser 41 of the potential adjustment beam projecting means 4, one which is the same as the semiconductive laser 31 of an image beam projecting means 3 is preferably used because the one which outputs laser beam with a wavelength which is less absorbed by the toner of a previously formed toner image is preferable and because a laser array in which the semiconductive lasers 31 and 41 are integrally arranged can be employed. Also, because the one which is the same as the beam diameter adjusting means 32 can be driven and controlled therewith in parallel and the one in which they are arranged integrally can be used, it is preferably used. |
