| 摘要 |
PURPOSE:To inspect a phase shift reticle for defects with good accuracy without transferring to a semiconductor substrate, using an actual transferring device and to realize the reduction in inspection work time and price. CONSTITUTION:The desired pattern housed in a magnetic memory 1 is given bit map extension to form a 2-image signal. When light penetrates a phase shift reticle 6, an image is formed on an image detector 8 to become an image signal by a magnifying projection lens 7 having the same optical lens transferring property as that of an actual transferring device. After both image signals are given an image processing 9 and a dislocation correction 11, defects on the reticle is detected (12). |
