| 摘要 |
PURPOSE:To prevent the chipping of a light shielding film pattern and the failing of the pattern due to defective adhesion to a transparent substrate. CONSTITUTION:This photomask blank has a transparent substrate 2 and a light shielding film 3 formed on one principal face of the substrate 2 and the film 3 contains Cr contg. 0.5-15wt.% Si. This photomask has a transparent substrate 2 and a light shielding film pattern 5 formed on one principal face of the substrate 2 and the pattern 5 contains Cr contg. 0.5-15wt.% Si. When the light shielding film 3 is etched at the time of producing this photomask, the undercut of the light shielding film pattern 5 can be prevented and the adhesion of the film 3 to the substrate 2 is satisfactory. The pattern 5 is not undercut and is excellent in adhesion to the substrate 2. |
