| 摘要 |
PURPOSE:To prevent the variation in transmittance of alignment light due to interference caused by a small variation in wavelength of the light in a transmission supporting film of a X-ray exposure mask. CONSTITUTION:The X-ray exposure mask comprises a frame 11, a first reflection preventive film 2, an X-ray transmission supporting film 3, a second reflection preventive film 4 and an X-ray absorber pattern 16. The frame 11 is formed only around the periphery to support a very thin X-ray transmission supporting film 3, etc. The films 2, 3, 4 are formed in a multilayer, integrated and extended to the frame 11 and a window formed of the frame. The pattern 16 is formed in the window, and an X-ray nontransmitting film is patterned on the window. |
