| 摘要 |
PURPOSE:To obtain a positive chemically sensitized photosensitive composition without the film being contracted by the baking after exposure and having a good profile and a high resolving power by incorporating an alkali-soluble resin, a photo-acid generating agent and a specified compd. into the composition. CONSTITUTION:This composition contains an alkali-soluble resin, a photo-acid generating agent and a compd. shown by the formula. In the formula, R<1>,...R<13> are hydrogen atom, alkyl, alkoxyl, acyl, acyloxy group, aryl, aryloxy group, aralkyl, aralkyloxy group, heterocyclic aryl, hydroxyl, carbonyl, halogen atom, nitro group or cyano group, X is -CO- or -SO2-, and A is an aryl. This positive photosensitive composition is used in the production of a lithographic printing plate or a semiconductor such as IC and in the photo-application process, the film is hardly contracted by the baking after exposure, and a good profile and a high resolving power are obtained. |
