发明名称 METHOD AND APPARATUS FOR CORRECTING FINE PATTERN
摘要 <p>PURPOSE:To realize correcting technique of a fine pattern having a short time required for correcting and a small residual part by variably setting a diameter of a spot of a particle beam in response to the size of a defective area. CONSTITUTION:A correcting position is specified according to defect information from a central controller 28, and then the size of a defect is determined. Then, the diameter of a spot is selected according to the determination result, and a beam current is varied by operating a voltage of a leading electrode 13 thereby to freely control the diameter of the beam spot. When one time correcting process of one defective part is finished, presence or absence of the residual defect is judged. If there is the residual defect, it is repeated. Thus, fine pattern correcting technique having a short time required for correcting and a small residual part can be realized.</p>
申请公布号 JPH05129180(A) 申请公布日期 1993.05.25
申请号 JP19910291556 申请日期 1991.11.07
申请人 FUJITSU LTD 发明人 HONJO ICHIRO
分类号 G03F1/72;G03F1/74;H01L21/027 主分类号 G03F1/72
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