| 摘要 |
The present invention provides an etching resist composition which can form an etching resist film having excellent adhesion with an indium tin oxide (ITO) film and strong acid resistance, and to a dry film having a resin layer obtained from the composition and, more specifically, to an etching resist composition, comprising an alkali-soluble resin having at least one structure of an urethane structure and a bisphenol structure, and to a dry film having a resin layer obtained from the composition. |
