发明名称 PATTERN-DEFECT INSPECTING APPARATUS
摘要 PURPOSE:To improve the resolution in the detection of pattern defects and to prevent the elongation of the detection without the adverse effect on the processing time and without elongating the processing time. CONSTITUTION:The inspected image data are obtained with image sensing devices 3 and 4 over a body to be inspected, wherein a plurality of many specified pattern layers are formed. The image signals from the image sensing devices are delayed. Or reference image data are obtained with other image sensing devices. The position of the inspected image data and the position of the reference image data are aligned with a position aligning circuit 11 based on the deviation of the detected position of a position-deviation detecting circuit 15. Thereafter, the differential differentiated value between the differentiated value A and the maximum value of the differentiated value B is computed with an inspecting circuit 16. The differentiated value A is located in the direction, which is determined by the differentiated value of the pixel data in the reference image data corresponding to the pixel data of the object of the inspection in the inspected image data. The differentiated value B is located in the same direction of the pixel data around the pixel data of the reference image data. The presence or absence of the pattern defect is judged based on the differential differentiated values.
申请公布号 JPH05126754(A) 申请公布日期 1993.05.21
申请号 JP19910286600 申请日期 1991.10.31
申请人 TOSHIBA CORP 发明人 INOUE HIROSHI
分类号 G01B11/24;G01B11/245;G01N21/88;G01N21/956;G06T1/00;G06T7/60;H01L21/66 主分类号 G01B11/24
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