发明名称 ACCEPTANCE ELEMENT FOR THERMAL TRANSFER PRINTING
摘要 PURPOSE: To improve light resistance of a copy obtained by thermal transfer printing by providing a dyestuff accepting layer containing the compound expressed by a specific general formula on the base material to form an acceptor element for thermal transfer printing. CONSTITUTION: An organic-solvent solution of a compound expressed by a general formula [where m shows 1-4, n shows 0-6, X shows CO2 , SO2 and O, Y shows 2-,3-,4-pyridyl radical, 2- or 3-pyrrolyl radical, 2-(N-methyl)pyrrolyl radical, 2- or 3-phryl radical, 1 or 2-naphthyl radical, 2-thiazolyl radical, 3- methyl-2-thiazolyl radical and the like, and R1 shows H and m-valent organic radical] is prepared. This solution is applied onto the supporter and dried, and the dyestuff accepting layer is formed to obtain the acceptor element for thermal transfer printing. For improving the adhesion of the accepting layer to the base material, an adhesion-improving intermediate layer may be applied onto the basic material under the accepting layer.
申请公布号 JPH05124369(A) 申请公布日期 1993.05.21
申请号 JP19920115432 申请日期 1992.04.08
申请人 CIBA GEIGY AG 发明人 SURURIATSUPA JIEGANASAN;HENRI DOUBASU
分类号 B41M5/382;B41M5/50;B41M5/52 主分类号 B41M5/382
代理机构 代理人
主权项
地址